CHARGED PARTICLE BEAM LITHOGRAPHY EQUIPMENT,申请号JP19900149755-传众专利搜索

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发明名称	CHARGED PARTICLE BEAM LITHOGRAPHY EQUIPMENT
摘要
申请公布号	JPH0443629(A)	申请公布日期	1992.02.13
申请号	JP19900149755	申请日期	1990.06.11
申请人	TOSHIBA CORP	发明人	IKENAGA OSAMU
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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