| 摘要 |
<p>The parent patent claimed a composite coating comprising three or more layers of similar compositions and comprising one or more transition metals (e.g. Ti, Ta, Hf and Fr) and metalloids (e.g. Cn N, O, Si and B), the layers being formed by reactive magnetron sputtering with successive variation of the partial pressure of the plasma-forming gas, the partial pressure of the reactive gas, and the target voltage or the cathodic discharge power density. In the present invention, for layers based on Ti and N, the partial pressure of plasma-forming gas (Ne, Kr, Xe or pref. Ar) is varied within the range 2.5-6 millitorr, the partial pressure of reactive gas (ammonia, hydrazine or pref. nitrogen) is varied within the range 0.2-0.5 millitor and the cathodic discharge power density is varied within the range 8-15 W/sq.cm. The resulting coating has improved resistance to abrasion and corrosion.</p> |
