PLASMA ETCHING METHOD,申请号JP19790125311-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	PLASMA ETCHING METHOD
摘要
申请公布号	JPS5651578(A)	申请公布日期	1981.05.09
申请号	JP19790125311	申请日期	1979.10.01
申请人	TOKYO SHIBAURA ELECTRIC CO	发明人	HORIIKE YASUHIRO;OKANO HARUO;SUGAWARA TAKUJI
分类号	C23F4/00;C23F1/00;H01L21/302;H01L21/3065	主分类号	C23F4/00
代理机构		代理人
主权项
地址

您可能感兴趣的专利

FACSIMILE EQUIPMENT AND FACSIMILE SYSTEM

LIQUID CRYSTALLINE POLYMER POWDER, MANUFACTURING METHOD THEREOF, AND FILLER-HIGHLY FILLED RESIN MATERIAL

TRANSMITTER FOR EMERGENCY OR TELEPHONE SET WITH TRANSMITTER

ARCHITECTURAL STRUCTURAL MATERIAL

METHOD AND DEVICE FOR CONTROLLING CVVT FOR AUTOMOBILE ENGINE

NETWORK SYSTEM, NETWORK MANAGEMENT PROGRAM AND RECORDING MEDIUM

ORGANOMODIFIED COLLOIDAL SILICA

SEMICONDUCTOR DEVICE

DEVICE, METHOD, AND PROGRAM FOR TIME-BASE COMPANDING OF AUDIO SIGNAL

ENCODING DEVICE, DECODING DEVICE AND RECORDING MEDIUM FOR TIME-SERIES SIGNAL

ELECTRIC THRUST PRODUCING DEVICE

SWITCHING POWER SUPPLY

STATOR OF GENERATOR

POWER CIRCUIT FOR PLASMA DISPLAY

METHOD AND APPARATUS FOR DEALING WITH THRESHOLD EVENT FROM HETEROGENEOUS MEASURING SOURCE

UTILIZATION OF GLOSS MARK FOR IMPROVING GRAPHIC ART WORK

SLEW RATE INCREASING APPARATUS

SURFACE WAVE DEVICE

DISTRIBUTED AMPLIFIER