| 摘要 |
PURPOSE:To secure the matching beetwen the wafer and the mask with a high controllability by deciding the error decision region by the value to the parallel shift in the mark disposition direction between the marks of the wafers in accordance with the pitch error for the decision of the matching. CONSTITUTION:Matching marks 34-37 plus 38 and 39 received spot scanning 40 and then waveform shaping 52 after optical detection 18 to be changed to pluses 41-46 of space omega1-omega5. Shift amount DELTAx and DELTAy based in the mask can be calculated with omega1-omega5. With shift amount DELTAx1, DELTAx2, DELTAy1 and DELTAy2 of each mathcing mark position, pitch error is as EP=(DELTAx1-DELTAx2)/2. Here, ¦DELTAx1+ or -DELTAy1-EP¦ and ¦Ep+DELTAx2+ or -DELTAy2¦ are calculated (54) and then decided (55). And then the motor is driven (57) to perform the control so that all of the above value may be within the allowable value and then to secure the matching. In this way, the mask can be matched with the wafer in accordance with the pitch error and without increasing the limit allowable region. |
