| 摘要 |
PURPOSE:To establish the unit in which the plasma processing rich in mass-production and absent in the dispersion in the quality can be made, by not inserting the processed material between the capacitor type electrode plates. CONSTITUTION:The reaction gas inlet 18 is placed on the processed body 13 to supply the reaction gas 20 excited in uniform plasma to the processed body 13, the gas dispersion operator 22 diffusing the gas 20 uniformly is inserted under the supply inlet 18 as required, and the capacitor type electrode plate 10 plasma exciting the gas 20 is placed. Further, the plasma processing is made with the gas 20 excited with the electrode 10. Accordingly, since the processed material is not inserted between the capacitor type electodes, even if high power is applied between the electrodes and plasma processing speed is increased, no electric damage is given to the processes material. Further, the reaction gas uniformly excited is fed to the processed material and the dispersion in the plasma processing can be avoided. |
