发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes: a first conductivity-type collector region; a second conductivity-type field stop region disposed on the collector region; a second conductivity-type drift region, which is disposed on the field stop region and has an impurity concentration lower than the field stop region; a first conductivity-type base region disposed on the drift region; and a second conductivity-type emitter region disposed on the base region, wherein an impurity concentration gradient in a film thickness direction of the field stop region is larger in a region adjacent to the collector region than in a region adjacent to the drift region.
申请公布号 US2016204236(A1) 申请公布日期 2016.07.14
申请号 US201514912621 申请日期 2015.01.14
申请人 SANKEN EELCTRIC CO., LTD 发明人 TORII Katsuyuki
分类号 H01L29/739;H01L29/10 主分类号 H01L29/739
代理机构 代理人
主权项 1. A semiconductor device comprising: a first conductivity-type collector region; a second conductivity-type field stop region disposed on the collector region; a second conductivity-type drift region, which is disposed on the field stop region and has an impurity concentration lower than the field stop region; a first conductivity-type base region disposed on the drift region; a second conductivity-type emitter region disposed on the base region; a gate insulating film disposed between the drift region and the emitter region so as to face to the base region; and a gate electrode disposed via the gate insulating film so as to be opposed to the base region, wherein an impurity concentration gradient in a film thickness direction of the field stop region is larger in a region adjacent to the collector region than in a region adjacent to the drift region.
地址 Niiza-shi, Saitama JP