发明名称 HEXANUCLEAR NOVOLAC COMPOUND AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain a new compound useful as a raw material or an additive of a resist for the fine processing of a semiconductor. SOLUTION: The objective compound is expressed by the formula (one of R<1> to R<5> is OH, one of R<6> to R<10> is OH and the remaining R<1> to R<10> are each H, a 1-6C alkyl or OH), e.g. 4,4'-methylenebis[2- 2-hydroxy-3-(2-hydroxybenzyl)-5- methylbenzyl}-3,6-dimethylphenol]. The compound can be produced by reacting 4,4'-methylenebis[2-(2-hydroxy-3-hydroxymethyl-5-methylbenzyl)-3,6- dimethylphenol] with a phenolic compound at a molar ratio of 1:(2-50) in the presence of an acidic catalyst.
申请公布号 JPH09110758(A) 申请公布日期 1997.04.28
申请号 JP19950270295 申请日期 1995.10.18
申请人 SUMITOMO CHEM CO LTD 发明人 ICHIKAWA KOJI;OZAKI HARUKI
分类号 B01J27/02;B01J27/06;B01J31/02;B01J31/04;C07B61/00;C07C37/16;C07C39/15 主分类号 B01J27/02
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