| 摘要 |
PURPOSE:To prevent the generation of plasma, and the like, from being adversely affected by providing two moving blades at a defined distance in a chamber and exhausting a space which is formed between both moving blades. CONSTITUTION:Plural moving blades 21 are provided along an axial direction at a defined distance in a chamber 1 which is connected to an exhaust port 2. A space part 25 is exhausted of a gas due to the high-speed rotation of a rotary body 15 and the gas is discharged out of the chamber 1. Thereby, a high vacuum is maintained in the space part 25, in which a vacuum analysis can be carried out without being affected by the discharge of a gas. Also, in the case of an etching operation by means of plasma, charged particles can be prevented from mixing into the plasma.
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