| 发明名称 |
Polarized radiation in lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
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| 申请公布号 |
US7345740(B2) |
申请公布日期 |
2008.03.18 |
| 申请号 |
US20050101630 |
申请日期 |
2005.04.08 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WAGNER CHRISTIAN;DE BOEIJ WILHELMUS PETRUS;DE JONGE ROEL;HEIL TILMANN;FIOLKA DAMIAN |
| 分类号 |
G03B27/72 |
主分类号 |
G03B27/72 |
| 代理机构 |
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代理人 |
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