发明名称 CERIUM OXIDE SLURRY FOR POLISHING, PROCESS FOR PREPARING THE SLURRY, AND PROCESS FOR POLISHING WITH THE SLURRY
摘要 <p>A cerium oxide slurry for polishing comprising cerium oxide dispersed in water, wherein the slurry has a conductivity of 30c.νS/cm or less when the cerium oxide concentration in the slurry is c wt.%. In order to adjust the conductivity to 30c.νS/cm or less, cerium oxide is washed with deionized water.</p>
申请公布号 WO2000037578(A1) 申请公布日期 2000.06.29
申请号 JP1999007166 申请日期 1999.12.21
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