发明名称 Silica glass optical material for excimer laser and excimer lamp, and method for producing the same
摘要 <p>In order to provide a silica glass optical material having a high initial transmittance, a small fluctuation in refractive index DELTA n, and an excellent durability to long term irradiation with radiations with a wavelength of 155 to 195 nm from excimer lasers and excimer lamps, a silica glass optical material is suugested which is characterized in that it is of ultrahigh purity, contains from 1 to 100 wtppm of OH groups, from 5 x 10<16> to 5 x 10<19> molecules/cm<3> of H2, and from 10 to 10,000 wtppm of F, but is substantially free from halogens other than F, and has a fluctuation in refractive index, DELTA n, in the range of from 3 x 10<-6> to 3 x 10<-7>.</p>
申请公布号 EP1094040(A2) 申请公布日期 2001.04.25
申请号 EP20000122418 申请日期 2000.10.13
申请人 HERAEUS QUARZGLAS GMBH;SHIN-ETSU QUARTZ PRODUCTS CO.,LTD. 发明人 YAMAGATA, SHIGERU, DR.
分类号 C03B8/04;C03B19/14;C03B20/00;C03C3/06;G02B1/00;G03F7/20;(IPC1-7):C03C3/06 主分类号 C03B8/04
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