| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing solvent for a resist substrate, the liquid that can easily and simultaneously solve problems of foreign matters on a pattern surface, pattern collapse and pattern roughness, and to provide a method for forming a pattern using the liquid. SOLUTION: The processing solvent for a resist substrate is characterized by comprising water and an alkylene oxide adduct of a primary amine or ammonia having a 11-30C hydrocarbon group. The method for forming a pattern uses the processing solvent. COPYRIGHT: (C)2007,JPO&INPIT |
