| 摘要 |
PURPOSE:To obtain an electron beam drawing device on which a large-sized sample can be easily set by providing a mechanism for measuring the thickness of a sample and a mechanism for adjusting the height of a reference pin. CONSTITUTION:A thickness measuring mechanism 81, in which a sensor 84 such as a noncontact sensor or the like is attached to respective one-side ends of a pair of arms 83, arranged with its free rotation around the center of a rotary axis 87. Firstly, the thickness of a sample 33 is measured by a measuring mechanism 81. Next, the piston rod 46A of a cylinder 46 is made to advance to relieve the clamp of a reference pin 36 followed by making a rotary knob 39 to advance in the right direction against a spring 38 to rotate an eccentric pin 37 for putting its large diameter part in the lowest position. A micrometer head 60 is rotated in this state, and the height of three pins 36 is made to accord with the thickness, that is, with the height of the sample 33 followed by rotating the pin 37 to make its large diameter part contact with the undersurface of a holder body 34. With this constitution, an electron drawing device on which a large-sized sample can be easily set can be obtained. |
