发明名称 |
TREATMENT SOLUTION SUPPLY METHOD, NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM, AND TREATMENT SOLUTION SUPPLY APPARATUS |
摘要 |
A treatment solution supply method includes: a degassed treatment solution generating step of degassing a treatment solution by a degassing mechanism to generate a degassed treatment solution; a treatment solution storing step of storing the degassed treatment solution in a container; a filter solution-passing step of bringing a downstream side from a filter connected to a downstream side from the container via a treatment solution supply pipe to a negative pressure with respect to a pressure in the container to pass the treatment solution in the container through the filter; and a negative pressure maintaining step of maintaining a state in which the downstream side from the filter is brought to the negative pressure, for a predetermined period, after stopping supply of the treatment solution from the container to the filter. |
申请公布号 |
US2016288032(A1) |
申请公布日期 |
2016.10.06 |
申请号 |
US201615078017 |
申请日期 |
2016.03.23 |
申请人 |
Tokyo Electron Limited |
发明人 |
SHITE Hideo;KIMURA Kazuhiko;YUMOTO Tomoyuki |
分类号 |
B01D36/00;B01D37/04;H01L21/67 |
主分类号 |
B01D36/00 |
代理机构 |
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代理人 |
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主权项 |
1. A treatment solution supply method of supplying a treatment solution onto a substrate, the method comprising:
a degassed treatment solution generating step of degassing the treatment solution by a degassing mechanism to generate a degassed treatment solution; a treatment solution storing step of storing the degassed treatment solution in a container; a filter solution-passing step of bringing a downstream side from a filter connected to a downstream side from the container via a treatment solution supply pipe to a negative pressure with respect to a pressure in the container to pass the degassed treatment solution in the container through the filter; and a negative pressure maintaining step of maintaining a state in which the downstream side from the filter is brought to the negative pressure, for a predetermined period, after stopping supply of the treatment solution from the container to the filter. |
地址 |
Tokyo JP |