发明名称 TREATMENT SOLUTION SUPPLY METHOD, NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM, AND TREATMENT SOLUTION SUPPLY APPARATUS
摘要 A treatment solution supply method includes: a degassed treatment solution generating step of degassing a treatment solution by a degassing mechanism to generate a degassed treatment solution; a treatment solution storing step of storing the degassed treatment solution in a container; a filter solution-passing step of bringing a downstream side from a filter connected to a downstream side from the container via a treatment solution supply pipe to a negative pressure with respect to a pressure in the container to pass the treatment solution in the container through the filter; and a negative pressure maintaining step of maintaining a state in which the downstream side from the filter is brought to the negative pressure, for a predetermined period, after stopping supply of the treatment solution from the container to the filter.
申请公布号 US2016288032(A1) 申请公布日期 2016.10.06
申请号 US201615078017 申请日期 2016.03.23
申请人 Tokyo Electron Limited 发明人 SHITE Hideo;KIMURA Kazuhiko;YUMOTO Tomoyuki
分类号 B01D36/00;B01D37/04;H01L21/67 主分类号 B01D36/00
代理机构 代理人
主权项 1. A treatment solution supply method of supplying a treatment solution onto a substrate, the method comprising: a degassed treatment solution generating step of degassing the treatment solution by a degassing mechanism to generate a degassed treatment solution; a treatment solution storing step of storing the degassed treatment solution in a container; a filter solution-passing step of bringing a downstream side from a filter connected to a downstream side from the container via a treatment solution supply pipe to a negative pressure with respect to a pressure in the container to pass the degassed treatment solution in the container through the filter; and a negative pressure maintaining step of maintaining a state in which the downstream side from the filter is brought to the negative pressure, for a predetermined period, after stopping supply of the treatment solution from the container to the filter.
地址 Tokyo JP