发明名称 PHOTOSENSITIVE RESIN, PHOTOSENSITIVE COMPOSITION AND PHOTOCROSSLINKED ITEM
摘要 <p>A photosensitive composition and photosensitive resin capable of easily forming a hydrophilic surface coating with high biocompatibility through photocrosslinking; and a photocrosslinked item therefrom. There is provided a photosensitive resin of the formula: (1) wherein the average of polymerization degree, n, is >= 5; each of R1 and R2 is an alkylene, an arylene, an oxyalkylene or a single bond, provided that R1 and R2 may be identical with or different from each other; each of X and Y independently is a photosensitive group unit of the following formula (2), or any one thereof is a photosensitive group unit of the following formula (2) while the other is an amino; R3 is a group selected from among those of the following formula (3) and R4 a group selected from among those of the following formula (4), provided that at least one of R3 and R4 has at least one azido group; and R 5 is a hydrogen atom, an alkyl, an acetal-group-having alkyl, an aryl, an aralkyl or a basic nitrogen-containing substituent.</p>
申请公布号 KR20070088511(A) 申请公布日期 2007.08.29
申请号 KR20077005832 申请日期 2007.03.13
申请人 TOYO GOSEI CO., LTD. 发明人 IKEYA TAKESHI;SHIBUYA TORU;MIYAZAKI KANA
分类号 G03F7/012;C08G65/32;C08G65/333;G03F7/004 主分类号 G03F7/012
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