发明名称 SEMICONDUCTOR DEVICE
摘要 In a semiconductor device, a contact stopper film (15) which applies stress is provided for covering an array (11) wherein MISFETs are arranged in a gate length direction. The stopper film has an extending portion (12) which extends outward with L=1µm or more from a gate electrode (14) of the MISFET at the furthest point of the array (11) of the MISFETs.
申请公布号 WO2008108339(A1) 申请公布日期 2008.09.12
申请号 WO2008JP53780 申请日期 2008.03.03
申请人 NEC CORPORATION;NAKAMURA, HIDETATSU;UEJIMA, KAZUYA 发明人 NAKAMURA, HIDETATSU;UEJIMA, KAZUYA
分类号 H01L21/8234;H01L21/8238;H01L27/088;H01L27/092;H01L29/78 主分类号 H01L21/8234
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