CRYSTAL PATTERN FORMING METHOD, PIEZOELECTRIC FILM MANUFACTURING METHOD, PIEZOELECTRIC ELEMENT MANUFACTURING METHOD, LIQUID JETTING HEAD MANUFACTURING METHOD, FERROELECTRIC ELEMENT, AND METHOD FOR MANUFACTURING SAME

摘要

[Problem] To provide a method for forming a crystal pattern on a desired area with a high accuracy. [Solution] This crystal pattern forming method has: an electromagnetic wave absorption layer forming step for forming an electromagnetic wave absorption layer on one surface of a substrate; an amorphous film forming step for forming an amorphous film on the electromagnetic wave absorption layer; a mask forming step for forming, on the other surface of the substrate, an electromagnetic wave blocking mask for blocking electromagnetic waves; and a crystallization step for crystallizing a predetermined region of the amorphous film by irradiating the substrate with electromagnetic waves from the other surface side of the substrate through the electromagnetic wave blocking mask.