发明名称 MASK BLANKS, PHOTOMASK, AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To enable recycling at low cost and with no limitation on the number of times without the need for re-polishing of expensive glass substrates.SOLUTION: A flat plate-like first glass 11 and a second glass 12 in which a mask pattern M can be formed are directly bonded in a peelable manner, and at a laminated face 13 where the first glass and second glass are laminated, an injection part 14 is provided to allow fluid to be injected for peeling.SELECTED DRAWING: Figure 1
申请公布号 JP2016180798(A) 申请公布日期 2016.10.13
申请号 JP20150059947 申请日期 2015.03.23
申请人 ULVAC SEIMAKU KK 发明人 KOJIMA TOMOAKI
分类号 G03F1/68;G03F1/60 主分类号 G03F1/68
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