发明名称 |
MANUFACTURING METHOD OF GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT, GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT, AND LAMP |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a group III nitride compound semiconductor that can easily optimize doping concentration of a dopant element in crystal of a gallium nitride compound semiconductor and efficiently deposit a film. <P>SOLUTION: Disclosed is the manufacturing method of the group III nitride compound semiconductor light emitting element wherein a Ga target 47a containing a Ga element and a dopant target 47b consisting of a dopant element are used to form at least a portion of a semiconductor layer by exciting the Ga target 47a by sputtering and exciting the dopant target 47b with charged particles in a beam shape. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2008311421(A) |
申请公布日期 |
2008.12.25 |
申请号 |
JP20070157670 |
申请日期 |
2007.06.14 |
申请人 |
SHOWA DENKO KK |
发明人 |
MIKI HISAYUKI;SASAKI YASUMASA;HANAWA KENZO |
分类号 |
H01L21/203;C23C14/06;C23C14/46;H01L33/06;H01L33/32;H01L33/36;H01L33/56;H01L33/60;H01L33/62;H01S5/323 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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