发明名称 MANUFACTURING METHOD OF GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT, GROUP III NITRIDE COMPOUND SEMICONDUCTOR LIGHT EMITTING ELEMENT, AND LAMP
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a group III nitride compound semiconductor that can easily optimize doping concentration of a dopant element in crystal of a gallium nitride compound semiconductor and efficiently deposit a film. <P>SOLUTION: Disclosed is the manufacturing method of the group III nitride compound semiconductor light emitting element wherein a Ga target 47a containing a Ga element and a dopant target 47b consisting of a dopant element are used to form at least a portion of a semiconductor layer by exciting the Ga target 47a by sputtering and exciting the dopant target 47b with charged particles in a beam shape. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008311421(A) 申请公布日期 2008.12.25
申请号 JP20070157670 申请日期 2007.06.14
申请人 SHOWA DENKO KK 发明人 MIKI HISAYUKI;SASAKI YASUMASA;HANAWA KENZO
分类号 H01L21/203;C23C14/06;C23C14/46;H01L33/06;H01L33/32;H01L33/36;H01L33/56;H01L33/60;H01L33/62;H01S5/323 主分类号 H01L21/203
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