| 摘要 |
PROBLEM TO BE SOLVED: To perform measurements on alignment with a correct focus position by adapting the measurement to optical characteristics of a position-detection optical system, even when the optical characteristics is changed in a method of exposure, an aligner, a method of manufacturing a device, and a microdevice. SOLUTION: The optical characteristics of the position-detection optical system 1 is changed arbitrarily, and the actually measured focusing position is corrected by adapting the measurement to the changed optical characteristics, namely, it is corrected with a focus offset value that is adapted to the changed optical characteristics, while the surface of a wafer W is positioned to the correct focusing position. As a consequence, errors due to the focus deviation are reduced, and exact measurement on alignment with the correct focus can be performed. |
