| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device which exerts a high cleaning effect.SOLUTION: A substrate cleaning device according to an embodiment comprises a stage part, a flow channel, cleaning liquid supply means, and a container. The stage part is capable of mounting a process target substrate. The flow channel is formed in a spiral shape and arranged at a position at an upward distance from a surface of the process target substrate when the process target substrate is mounted on the stage part. The cleaning liquid supply means supplies a cleaning liquid for cleaning the process target substrate to the flow channel. The container is formed to cover the stage part and a part of the flow channel at least when the process target substrate is subjected to cleaning treatment and accumulates the cleaning liquid discharged from the flow channel. |
