| 摘要 |
PURPOSE:To aim at improvement in a residual emission rate, by installing a process which applies suspension inclusive of a metallic alkoxide compound on the surface of a shadow, mask, and also another process which performs heat treatment for the shadow mask. CONSTITUTION:Suspension of an alkoxide compound consisting of silicon containing zircon and zirconia is applied to one side of main surfaces having a through hole 7a of a shadow mask 7, for example, to a main surface coming to a concave surface at the side of an electron gun 6 when being set up oppositely proximate to a screen 4, and it is heated in an atmosphere of more than 70 deg.C in temperature whereby a layer 13 is formed up. The alkoxide compound of silicon and zirconia applied to the shadow mask 12 caused hydrolysis due to moisture or the like in the atmosphere in an ambience of more than 70 deg.C in temperature, and in consequence, there is produced a film due to a condensation polymerization reaction between alkoxide themselves, thereby forming a mixture layer of amorphous silicon containing zircon, a metallic oxide of zirconia and metal hydroxide.
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