METHOD AND DEVICE FOR FORMING CARBON FILM

摘要

PURPOSE:To easily form a hard carbon film on a disk by disposing a disk and counter electrode having an area larger than the area of the part to be treated of the disk into a vacuum vessel and allowing high-energy ions to flow onto the surface to be treated. CONSTITUTION:A plasma treatment chamber 3 is formed of the disk 9 held by a disk carrier 10 and the counter electrode 7 having the area sufficiently larger than the area of the part to be treated of the disk 9 in the vacuum vessel 1. The disk carrier 10 is grounded. A reactive gas is then introduced from a gas introducing port 6 into the plasma treatment chamber 3 through small holes 8 and a high-frequency voltage is supplied to the counter electrode 7 from a high-frequency impressing mechanism 4. The condition for admitting the high-energy ions into the surface of the part to be treated is thereby created and the hard carbon film is easily formed on the disk 9.