DEPILATORY COMPOSITIONS COMPRISING SULFHYDRYL COMPOUNDS.

摘要

The subject invention involves topical depilatory compositions, at a pH of 7 or below, comprising sulfhydryl compounds. The subject invention further relates to methods for removing vellus hair from mammalian skin comprising topical application of a composition, at a pH of 7 or below, comprising a sulfhydryl compound or a cosmetically- and/or pharmaceutically- acceptable salt thereof.