USE OF CHITOSAN OR ALGINATE AS A TRANSFER MASK IN LITHOGRAPHY AND TRANSFER METHODS

摘要

The present invention relates to a lithography and transfer method including the following consecutive steps: a) a step for depositing at least one biopolymer onto a substrate from an aqueous solution of said biopolymer; b) a step for exposing localized areas of the deposited biopolymer(s) to electromagnetic radiation or to an electron or ion beam in a pattern or series of patterns; c) a development step, causing the removal of the biopolymer(s) on the exposed areas so as to obtain substrate areas that are not covered with biopolymer(s) and that correspond to said pattern or to said series of patterns, which areas are defined by a mask of biopolymer(s); d) a step for transferring the pattern or series of patterns by etching, deposition, and/or implanting onto the areas of the substrate that are not covered by the mask of biopolymer(s); and e) a step for selectively removing the mask of biopolymer(s) deposited onto the substrate, the biopolymer(s) being selected from among chitosan and alginates.