发明名称 VERFAHREN UND VORRICHTUNG ZUR ZUSTANDSANALYSE.
摘要 In the apparatus, the electron beam (12) from an electron gun (11) is incident upon a measurement point on the sample (10) which is to be analysed, the beam being directed by a condensor lens (13) and an objective lens (14). A scanning coil (15) is provided to enable scanning of the sample (10) which, in response to the beam (12) emits an X-ray (16) and secondary electrons. Two wavelength dispersive spectrometers are provided to detect the characteristic X-ray (16). One spectrometer comprises a spectroscopic crystal (17) as a wavelength dispersion device and a detector (18). The other spectrometer comprises the wavelength dispersing spectroscopic crystal (19) and the detector (20). The two spectrometers, with the same sensitivity, detect the characteristic X-rays, each set to three differing wavelengths. A number of measur ement points are scanned with a line analysis or two dimentional scanning image being displayed.
申请公布号 DE3585533(D1) 申请公布日期 1992.04.09
申请号 DE19853585533 申请日期 1985.06.11
申请人 SHIMADZU CORP 发明人 SOEZIMA HIROYOSHI
分类号 G01N23/225;H01J37/256;(IPC1-7):G01N23/225 主分类号 G01N23/225
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