| 摘要 |
PROBLEM TO BE SOLVED: To provide a processor, capable of preventing generation of the concentrated spots of an organic solvent on a substrate surface, when supplying the steam of the organic solvent to a substrate exposed from processing liquid stored inside a processing vessel and drying the substrate. SOLUTION: This substrate processor is provided with an adjustment exhaust pipe 34, provided with a suction port 32 and an evacuation pump 38 so as to evacuate the inside of a processing chamber 12, when the substrate W is pulled from pure water inside the processing vessel 10 by a lifter 14. The evacuation pump is controlled by a controller 42, and evacuation flow rate is adjusted.
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