发明名称 COMPOSITION, FILM FORMING METHOD AND APPARATUS, ELECTROOPTICAL APPARATUS AND ITS MANUFACTURING METHOD, ORGANIC ELECTROLUMINESCENCE DEVICE AND ITS MANUFACTURING METHOD, DEVICE AND ITS MANUFACTURING METHOD, AND ELECTRONIC APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a liquid composition which suppresses bubble forming when a pattern forming material is liquified, and a film forming apparatus which forms productively a film pattern by using the liquid composition. <P>SOLUTION: The film forming apparatus comprises a liquid composition producing unit S which produces the liquid composition containing an organic functional material, a solvent, and a surfactant, and a liquid discharging unit IJ which discharges liquid drops composed of the liquid composition produced in the liquid composition producing unit S to a board P. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004087482(A) 申请公布日期 2004.03.18
申请号 JP20030189513 申请日期 2003.07.01
申请人 SEIKO EPSON CORP 发明人 ENDO SAE;SEKI SHUNICHI
分类号 G02B5/20;H01L21/336;H01L29/786;H01L51/00;H01L51/05;H01L51/40;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):H05B33/14 主分类号 G02B5/20
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