发明名称 |
COMPOSITION, FILM FORMING METHOD AND APPARATUS, ELECTROOPTICAL APPARATUS AND ITS MANUFACTURING METHOD, ORGANIC ELECTROLUMINESCENCE DEVICE AND ITS MANUFACTURING METHOD, DEVICE AND ITS MANUFACTURING METHOD, AND ELECTRONIC APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid composition which suppresses bubble forming when a pattern forming material is liquified, and a film forming apparatus which forms productively a film pattern by using the liquid composition. <P>SOLUTION: The film forming apparatus comprises a liquid composition producing unit S which produces the liquid composition containing an organic functional material, a solvent, and a surfactant, and a liquid discharging unit IJ which discharges liquid drops composed of the liquid composition produced in the liquid composition producing unit S to a board P. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004087482(A) |
申请公布日期 |
2004.03.18 |
申请号 |
JP20030189513 |
申请日期 |
2003.07.01 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ENDO SAE;SEKI SHUNICHI |
分类号 |
G02B5/20;H01L21/336;H01L29/786;H01L51/00;H01L51/05;H01L51/40;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):H05B33/14 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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