发明名称 |
Heat-resistant photoresist composition and negative-type pattern formation method |
摘要 |
A heat-resistant negative-working photoresist composition comprising a resin component having a carbodiimide unit in the molecule, and a compound capable of inducing a basic compound by irradiation with actinic rays. The photosensitive layer formed by the photoresist composition shows a sufficient sensitivity even by a lower irradiation energy and can give a sharp negative-type pattern by irradiation with actinic rays such as ultraviolet rays.
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申请公布号 |
US5645979(A) |
申请公布日期 |
1997.07.08 |
申请号 |
US19960708938 |
申请日期 |
1996.09.06 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
MOCHIZUKI, AMANE;ISHII, MICHIE;MAEDA, MASAKO;HIGASHI, KAZUMI |
分类号 |
C08L79/00;G03F7/004;G03F7/038;(IPC1-7):G03F7/32;G03F7/38 |
主分类号 |
C08L79/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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