| 发明名称 |
METHOD OF POSITION DETECTION |
| 摘要 |
PURPOSE:To defect the position of a wafer at high S/N ratio and high accuracy by using a V-form recess having a specified angle provided on the main surface of the wafer as a mask, radiating radiation through the mark perpendicularly from the underside of the wafer and from the change in the quantity of its transmission. |
| 申请公布号 |
JPS5376054(A) |
申请公布日期 |
1978.07.06 |
| 申请号 |
JP19760150897 |
申请日期 |
1976.12.17 |
| 申请人 |
HITACHI LTD;NIPPON TELEGRAPH & TELEPHONE;NIPPON ELECTRIC CO;FUJITSU LTD |
发明人 |
TAKEMOTO KAYAO;MIYAZAKI MASARU;NAKAYAMA SATORU;MIMURA YOSHIAKI;MATSUI JIYUNJI;SHIRATORI TAKANAO |
| 分类号 |
G01D5/26;G01B11/00;G01D5/347;H01L21/027;H01L21/68 |
主分类号 |
G01D5/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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