发明名称 TUNNEL BARRIER SCHOTTKY
摘要 A diode includes: a semiconductor substrate; a cathode metal layer contacting a bottom of the substrate; a semiconductor drift layer on the substrate; a graded aluminum gallium nitride (AIGaN) semiconductor barrier layer on the drift layer and having a larger bandgap than the drift layer, the barrier layer having a top surface and a bottom surface between the drift layer and the top surface, the barrier layer having an increasing aluminum composition from the bottom surface to the top surface; and an anode metal layer directly contacting the top surface of the barrier layer.
申请公布号 WO2017027074(A1) 申请公布日期 2017.02.16
申请号 WO2016US27750 申请日期 2016.04.15
申请人 HRL LABORATORIES, LLC 发明人 CHU, Rongming;CAO, Yu;LI, Zijian;WILLIAMS, Adam, J.
分类号 H01L29/872;H01L29/47 主分类号 H01L29/872
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