A diode includes: a semiconductor substrate; a cathode metal layer contacting a bottom of the substrate; a semiconductor drift layer on the substrate; a graded aluminum gallium nitride (AIGaN) semiconductor barrier layer on the drift layer and having a larger bandgap than the drift layer, the barrier layer having a top surface and a bottom surface between the drift layer and the top surface, the barrier layer having an increasing aluminum composition from the bottom surface to the top surface; and an anode metal layer directly contacting the top surface of the barrier layer.
申请公布号
WO2017027074(A1)
申请公布日期
2017.02.16
申请号
WO2016US27750
申请日期
2016.04.15
申请人
HRL LABORATORIES, LLC
发明人
CHU, Rongming;CAO, Yu;LI, Zijian;WILLIAMS, Adam, J.