发明名称 PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE
摘要 Provided are: a photosensitive resin composition having a wide exposure latitude; a precursor composition for providing this photosensitive resin composition; a method for producing a precursor composition; a cured film; a method for producing a cured film; and a semiconductor device. A precursor composition which contains at least one heterocycle-containing polymer precursor, and wherein: the heterocycle-containing polymer precursor is selected from among polyimide precursors and polybenzoxazole precursors; and the degree of dispersion, which is expressed by (weight average molecular weight)/(number average molecular weight) of the heterocycle-containing polymer precursor, is 2.5 or more.
申请公布号 WO2017002858(A1) 申请公布日期 2017.01.05
申请号 WO2016JP69274 申请日期 2016.06.29
申请人 FUJIFILM CORPORATION 发明人 SHIBUYA Akinori;IWAI Yu;KAWABATA Takeshi;KOYAMA Ichiro
分类号 C08G73/10;C08F2/44;C08F283/04;C08F290/14;C08G73/22;G03F7/023;G03F7/027;G03F7/20 主分类号 C08G73/10
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