| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a coating film and a coating device capable of obtaining the coating film with excellent film thickness accuracy.SOLUTION: A method for forming a coating film comprises: a first coating step to coat a substrate with a coating liquid to form the coating film having a predetermined film thickness; a waiting step to wait the coating of the coating liquid to a first coating film until rising due to a coffee-stain phenomenon occurs at the outer periphery of the first coating film formed on a substrate by the first coating step; and a second coating step to overlay the coating liquid from above the first coating film. In the second coating step, a region to discharge the coating liquid is the inside of a region possessed by the first coating film. |
