发明名称 ULTRAVIOLET RAY RADIATION DEVICE, ULTRAVIOLET RAY RADIATION METHOD, SUBSTRATE PROCESSING DEVICE, AND PRODUCTION METHOD OF SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an ultraviolet ray radiation device, an ultraviolet ray radiation method, a substrate processing device, and a production method of a substrate processing device, capable of suppressing bending of a substrate and radiating an ultraviolet ray.SOLUTION: The ultraviolet ray radiation device of the invention comprises: a substrate movement mechanism for moving in a first direction in a state of holding a rectangular substrate; and a radiation part for radiating an ultraviolet ray to a lower face of the substrate which moves in the first direction by the substrate movement mechanism. The substrate movement mechanism has a frame-state holding member for holding at least three sides of an outer peripheral edge part on the lower face of the substrate.SELECTED DRAWING: Figure 1
申请公布号 JP2016114784(A) 申请公布日期 2016.06.23
申请号 JP20140253303 申请日期 2014.12.15
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SATO MASAHIKO;SAHODA TSUTOMU
分类号 G03F7/20;H01L21/027;H01L21/683 主分类号 G03F7/20
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