发明名称 |
ULTRAVIOLET RAY RADIATION DEVICE, ULTRAVIOLET RAY RADIATION METHOD, SUBSTRATE PROCESSING DEVICE, AND PRODUCTION METHOD OF SUBSTRATE PROCESSING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide an ultraviolet ray radiation device, an ultraviolet ray radiation method, a substrate processing device, and a production method of a substrate processing device, capable of suppressing bending of a substrate and radiating an ultraviolet ray.SOLUTION: The ultraviolet ray radiation device of the invention comprises: a substrate movement mechanism for moving in a first direction in a state of holding a rectangular substrate; and a radiation part for radiating an ultraviolet ray to a lower face of the substrate which moves in the first direction by the substrate movement mechanism. The substrate movement mechanism has a frame-state holding member for holding at least three sides of an outer peripheral edge part on the lower face of the substrate.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016114784(A) |
申请公布日期 |
2016.06.23 |
申请号 |
JP20140253303 |
申请日期 |
2014.12.15 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SATO MASAHIKO;SAHODA TSUTOMU |
分类号 |
G03F7/20;H01L21/027;H01L21/683 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|