发明名称 ORGANIC PHOTOELECTRIC CONVERSION DEVICE AND PRODUCTION METHOD THEREOF
摘要 An organic photoelectric conversion device having an anode, a cathode, an active layer disposed between the anode and the cathode, and a hole injection layer disposed between the anode and the active layer, wherein the cathode is an electrode containing an electrically conductive nano-substance, and the hole injection layer is a layer having a residual film rate of 80% or more in measurement of the residual film rate after water rinse treatment.
申请公布号 US2016111669(A1) 申请公布日期 2016.04.21
申请号 US201514885075 申请日期 2015.10.16
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 UETANI Yasunori
分类号 H01L51/42;H01L51/00;H01L51/44 主分类号 H01L51/42
代理机构 代理人
主权项 1. An organic photoelectric conversion device having an anode, a cathode, an active layer disposed between the anode and the cathode, and a hole injection layer disposed between the anode and the active layer, wherein the cathode is an electrode containing an electrically conductive nano-substance, and the hole injection layer is a layer having a residual film rate of 80% or more in measurement of the residual film rate after water rinse treatment shown below:<Method of measurement of residual film rate after water rinse treatment> On a 1-inch square substrate, a film is formed by spin coating so as to give the same film thickness as in the case of film formation as the hole injection layer in the organic photoelectric conversion device, then, a water rinse treatment in which water is placed in the form of meniscus on the film, allowed to stand still for 30 seconds, then, the film is spun at 4000 rpm to fling away water is conducted. The film thicknesses before and after the water rinse treatment are measured by a contact type thickness meter, and (film thickness after water rinse treatment)/(film thickness before water rinse treatment)×100(%) is defined as the residual film rate after water rinse treatment.
地址 Tokyo JP