Nitride semiconductor laser element

摘要

Provided is a highly reliable nitride semiconductor laser element having a robust end face protection film not being peeled even in laser operation. The nitride semiconductor laser element includes: a semiconductor multi-layer structure including a group III nitride semiconductor and having a light-emitting end face; and a protection film including a dielectric multi-layer film and covering the light-emitting end face of the semiconductor multi-layer structure. The protection film includes an end face protection layer and an oxygen diffusion suppression layer arranged sequentially in stated order from the light-emitting end face. The end face protection layer includes a crystalline film comprising nitride including aluminum. The oxygen diffusion suppression layer has a structure in which a metal oxide film is between silicon oxide films. The metal oxide film is crystallized by laser light.

主权项

1. A nitride semiconductor laser element comprising:
a semiconductor laminate made of a group III nitride semiconductor and including a light-emitting end surface; and a protection film formed of a dielectric multilayer film formed to cover the light-emitting end surface of the semiconductor laminate, wherein the protection film includes an end surface protection layer and an oxygen diffusion suppressing layer, and the end surface protection layer and the oxygen diffusion suppressing layer are disposed in order of the end surface protection layer and the oxygen diffusion suppressing layer from a side of the light-emitting end surface; the end surface protection layer is a layer including a crystalline aluminum nitride film; the oxygen diffusion suppressing layer includes at least a single layer of a metal oxide film and at least a single layer of a silicon oxide film, and the silicon oxide film and the metal oxide film are disposed in this order from a side of the end surface protection layer; and the metal oxide film is crystallized by laser light emitted from the light-emitting end surface, and the metal oxide film is aluminum oxide film.