发明名称 |
Continuous diffusion configurable standard cell architecture |
摘要 |
At least one configurable circuit cell with a continuous active region includes at least one center subcell, a first-side subcell, and a second-side subcell. Each center subcell includes first and second pMOS transistors and first and second nMOS transistors. The first pMOS transistor has a first-pMOS-transistor gate, source, and drain. The first-pMOS-transistor source is coupled to a first voltage source. The second pMOS transistor has a second-pMOS-transistor gate, source, and drain. The second-pMOS-transistor source is coupled to the first voltage source. The first-pMOS-transistor drain and the second-pMOS-transistor drain are a same drain. The first nMOS transistor has a first-nMOS-transistor gate, source, and drain. The first-nMOS-transistor source is coupled to a second voltage source. The second nMOS transistor has a second-nMOS-transistor gate, source, and drain. The second-nMOS-transistor source is coupled to the second voltage source. The first-nMOS-transistor drain and the second-nMOS-transistor drain are a same drain. |
申请公布号 |
US9306570(B1) |
申请公布日期 |
2016.04.05 |
申请号 |
US201514603262 |
申请日期 |
2015.01.22 |
申请人 |
QUALCOMM Incorporated |
发明人 |
Sahu Satyanarayana;Puckett Joshua Lance;Kwon Ohsang;Goodall, III William James;Bowers Benjamin John |
分类号 |
H03K19/177;H01L25/00;H03K19/0175;H03K19/20;H01L27/118 |
主分类号 |
H03K19/177 |
代理机构 |
Arent Fox LLP |
代理人 |
Arent Fox LLP |
主权项 |
1. A semiconductor die comprising at least one configurable circuit cell comprising:
at least one center subcell, each of the at least one center subcell comprising:
a first p-type metal oxide semiconductor (pMOS) transistor having a first pMOS transistor gate, a first pMOS transistor source, and a first pMOS transistor drain, the first pMOS transistor source being coupled to a first voltage source;a second pMOS transistor having a second pMOS transistor gate, a second pMOS transistor source, and a second pMOS transistor drain, the second pMOS transistor source being coupled to the first voltage source, the first pMOS transistor drain and the second pMOS transistor drain being a same drain;a first n-type metal oxide semiconductor (nMOS) transistor having a first nMOS transistor gate, a first nMOS transistor source, and a first nMOS transistor drain, the first nMOS transistor source being coupled to a second voltage source; anda second nMOS transistor having a second nMOS transistor gate, a second nMOS transistor source, and a second nMOS transistor drain, the second nMOS transistor source being coupled to the second voltage source, the first nMOS transistor drain and the second nMOS transistor drain being a same drain; a first side subcell on a first side of the at least one center subcell; and a second side subcell on a second side of the at least one center subcell, the at least one center subcell, the first side subcell, and the second side subcell having a continuous active region. |
地址 |
San Diego CA US |