METHOD OF DECOMPOSING LAYOUT OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

摘要

In a method of decomposing a layout of a semiconductor device, a polygon, which includes a plurality of intersections at each of which at least two lines are crossed, among polygons included in the layout of the semiconductor device may be determined as a complex polygon. A first stitch may be inserted between the plurality of intersections on the complex polygon. A plurality of decomposed patterns may be generated by performing a pattern dividing operation on the layout.

主权项

1. A method of decomposing a layout of a semiconductor device, comprising:
determining a polygon is a complex polygon among polygons included in the layout of the semiconductor device, the complex polygon including a plurality of intersections where at least two lines are crossed; inserting a first stitch between the plurality of intersections on the complex polygon; and generating a plurality of decomposed patterns by performing a pattern dividing operation on the layout.