| 发明名称 |
RESIST UNDERLAYER COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME |
| 摘要 |
An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent.;;in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2.;;in Formula 4, n is an integer of 1 to 250. |
| 申请公布号 |
US2016053132(A1) |
申请公布日期 |
2016.02.25 |
| 申请号 |
US201414779769 |
申请日期 |
2014.03.24 |
| 申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
LEE Jung-Youl;LIM Young Bae;KIM Jong-Won;LEE Jae Woo;KIM Jae Hyun |
| 分类号 |
C09D165/02;G03F7/40 |
主分类号 |
C09D165/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An under-layer composition of resist comprising:
an aromatic ring containing polymer having the repeating unit of the following Formula 1, in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2; a compound of the following Formula 4, in Formula 4, n is an integer of 1 to 250; and an organic solvent. |
| 地址 |
Incheon KR |
