| 摘要 |
A mask has a plurality of patterns to be tested, a region formed with the patterns to be tested, and a plurality of patterns for position measurement, which are formed around the region. Position coordinates of the patterns for position measurement are measured by a position measurement device. Data for correcting a first position is written by obtaining optical images of the patterns for position measurement while measuring a position coordinate of a table supporting the mask. By using a position coordinate of a second pattern by the position measurement device, the data for correcting the first position is corrected, and data for correcting a second position is written. While the position coordinate of the table is measured, each optical image of the patterns to be tested and the patterns for position measurement is obtained to gain a position coordinate of each pattern. The position coordinates of the patterns to be tested are corrected by using the data for correcting the second position. |
