CHEMICAL CONTROL FEATURES IN WAFER PROCESS EQUIPMENT

摘要

Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.

主权项

1. A gas distribution assembly, comprising:
an annular body comprising:
an inner annular wall located at an inner diameter, an outer annular wall located at an outer diameter, an upper surface, and a lower surface;an upper recess formed in the upper surface;a lower recess formed in the lower surface;a first fluid channel defined in the lower surface that is located in the annular body radially inward of the lower recess; an upper plate coupled with the annular body at the upper recess, wherein the upper plate defines a plurality of first apertures; and a lower plate coupled with the annular body at the lower recess, and covering the first fluid channel, the lower plate comprising:
a plurality of second apertures defined therein, wherein the second apertures align with the first apertures defined in the upper plate;a plurality of third apertures defined therein and located between the second apertures; wherein the upper and lower plates are coupled with one another such that the first and second apertures are aligned to form a channel through the upper and lower plates.