Microcontact printed films as an activation layer for selective atomic layer deposition

摘要

The present application relates to methods of forming patterned thin films on a substrate. In some embodiments a first patterned layer may be deposited on a substrate by a imprint lithography technique, such as microcontact printing. A second layer of a desired composition is selectively deposited over the first patterned layer by a vapor phase deposition process, such as ALD or CVD.

主权项

1. A method for selectively depositing a thin film on a substrate comprising:
printing a first layer consisting of a metal halide on the substrate by microcontact printing, wherein the first layer consisting of the metal halide is subsequently converted to a first inorganic activation layer; and subsequently selectively depositing a second layer on the first inorganic activation layer by a chemical vapor deposition process or an atomic layer deposition process, wherein the second layer consists essentially of an elemental metal or a metal alloy.