发明名称 Composition for antistatic layer
摘要 The present invention discloses a composition for antistatic layer formation, which has realized antireflection and prevention of interference fringes. The composition for antistatic layer formation comprises electrically conductive fine particles, an ionizing radiation curing resin, and an organic solvent, the electrically conductive fine particles each comprising a core particle covered with an electrically conductive material, the refractive index of the core particle being lower than that of the electrically conductive material.
申请公布号 US7713613(B2) 申请公布日期 2010.05.11
申请号 US20050225897 申请日期 2005.09.13
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 SHINOHARA SEIJI
分类号 B32B27/32;B32B3/26;B32B5/14;B32B5/16;B32B9/00;B32B17/10 主分类号 B32B27/32
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