LITHOGRAPHY APPARATUS AND METHOD FOR LITHOGRAPHY AND STAGE SYSTEM

摘要

Provided are a lithography device, a method thereof, and a stage system. The lithography device comprises a reticle stage to which a reticle is fixed; at least one nozzle which is formed on at least one surface of the reticle stage and forms an air curtain by forcing protective gas to flow along the surface of the reticle; and a gas supply unit which supplies the protective gas to the nozzle.