发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a vapor deposition mask, a vapor deposition mask preparation body, and further a method of manufacturing organic semiconductor element using the vapor deposition mask such that higher definition and less weight are both attained even when the size increases, and a manufacturing process using the vapor deposition mask can be improved in yield and quality.SOLUTION: A vapor deposition mask 100 formed by laminating a metal mask 10, provided with a slit 15 overlapping an opening part 25 corresponding to a pattern to be formed by vapor deposition, on one surface of a resin mask 20 provided with the opening part 25 is provided with a plurality of alignment marks 40 at a part of a surface on a side, contacting the resin mask 20, of the metal mask 10, and at least one of the alignment marks 40 is positioned not in contact with one surface of the resin mask 20.</p>
申请公布号 JP2015178662(A) 申请公布日期 2015.10.08
申请号 JP20140056804 申请日期 2014.03.19
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKEDA TOSHIHIKO;OBATA KATSUYA;OKAMOTO EISUKE
分类号 C23C14/04;C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/04
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