| 发明名称 |
METHOD FOR MANUFACTURING ELECTRONIC DEVICE |
| 摘要 |
When a thin film is formed by an application method, damage to a substrate or existing electrodes and functional layers can be reduce. A method for manufacturing an electronic device comprising two or more electrodes, and an organic thin film provided between the two or more electrodes, the method comprising the steps of: forming a coating film by applying a coating liquid that comprises a material having a crosslinking group, and forming the organic thin film by repeating an irradiation of electromagnetic waves to the coating film to cross-link with the crosslinking group. |
| 申请公布号 |
US2015280126(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201314434518 |
申请日期 |
2013.10.07 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
Rokuhara Kouichi;Sassa Shuichi |
| 分类号 |
H01L51/00;H01L51/44;H01L51/56;H01L51/10 |
主分类号 |
H01L51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing an electronic device comprising two or more electrodes and an organic thin film provided between the two or more electrodes, the method comprising the steps of:
forming a coating film by applying a coating liquid that comprises a material having a crosslinking group, and forming the organic thin film by repeating an irradiation of electromagnetic waves to the coating film to cross-link with the crosslinking group. |
| 地址 |
Tokyo JP |
