发明名称 Universal edged-based wafer alignment apparatus
摘要 An apparatus for aligning a wafer. The edge of a wafer is mapped by means of a photodetector array and a light source to provide a signal representative of the X-Y position and angular orientation of the wafer as the wafer is rotated one revolution on a shaft. The signal is digitized and processed to provide stored information of the X-Y position and angular orientation of the wafer. The shaft is then rotated to move the wafer from its calculated angular orientation to a desired angular orientation. The X-Y positional information may be used to center the wafer.
申请公布号 US4907035(A) 申请公布日期 1990.03.06
申请号 US19860842145 申请日期 1986.03.21
申请人 THE PERKIN-ELMER CORPORATION 发明人 GALBURT, DANIEL N.;BUCKLEY, JERE D.
分类号 G03F9/00 主分类号 G03F9/00
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