发明名称 |
Universal edged-based wafer alignment apparatus |
摘要 |
An apparatus for aligning a wafer. The edge of a wafer is mapped by means of a photodetector array and a light source to provide a signal representative of the X-Y position and angular orientation of the wafer as the wafer is rotated one revolution on a shaft. The signal is digitized and processed to provide stored information of the X-Y position and angular orientation of the wafer. The shaft is then rotated to move the wafer from its calculated angular orientation to a desired angular orientation. The X-Y positional information may be used to center the wafer.
|
申请公布号 |
US4907035(A) |
申请公布日期 |
1990.03.06 |
申请号 |
US19860842145 |
申请日期 |
1986.03.21 |
申请人 |
THE PERKIN-ELMER CORPORATION |
发明人 |
GALBURT, DANIEL N.;BUCKLEY, JERE D. |
分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|