PLASMA DEVICE, CARBON THIN FILM MANUFACTURING METHOD AND COATING METHOD USING PLASMA DEVICE

摘要

A plasma device (10) including a vacuum container (1), an arc-type evaporation source (3), a negative electrode member (4), a shutter (5), a power source (7), and a trigger electrode (8) is described. The arc-type evaporation source (3) is fixed to the side wall of the vacuum container (1) so as to face the substrate (20). The negative electrode member (4) is made from vitreous carbon having a protrusion and is mounted on the arc-type evaporation source (3). The power source (7) applies a negative voltage to the arc-type evaporation source (3). The trigger electrode (8) comes into contact with or separates away from the protrusion on the negative electrode member (4). A negative voltage is applied to the arc-type evaporation source (3), the trigger electrode (8) is brought into contact with the protrusion on the negative electrode member (4), an arc discharge is generated, the shutter (5) is opened, and a carbon thin film is formed on the substrate (20).