| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method capable of forming a sufficiently fine pattern conveniently.SOLUTION: A patterning method includes a step for forming a coating film, where a second polymer is distributed unevenly in a surface layer region, by using a composition containing a first polymer of block copolymer and the second polymer having surface free energy smaller than that of the block copolymer, a step for self-organizing at least a part of the coating film, by phase separation in the substantially vertical direction, and a step for removing a partial phase of the self-organization film. The self-organization film is preferably composed of the first copolymer. The value obtained by subtracting the surface free energy of the second polymer from that of the first polymer is preferably 1-20 mN/m. |
