| 摘要 |
<p>The present invention relates to a substrate processing apparatus capable of certainly detecting the injection of a process solution from a nozzle without a kind of a substrate as a process object, and a substrate processing method. An upper process solution nozzle (30) reciprocates between the upper process position of a substrate (W) supported by a spin chuck (20) and the outer waiting position of a process cup (40). A camera photographs a photographing region which includes the front end of the upper process solution nozzle (30) before the upper process solution nozzle (30), moving to the process position, injecting the process solution, and obtains an injection reference image. After that, the injection reference image is compared with monitoring object images obtained by successively photographing the photographing region using the camera (70), and the injection of the process solution from the upper process solution nozzle (30) is determined. Whenever the substrate (W) as a new process object is processed, an injection reference image is obtained. Therefore, the injection of the process solution can be certainly detected without an effect of a substrate surface arranged as a background for the monitoring object image and the injection reference image.</p> |
